The corrosion inhibition mechanism of a new yellow metal corrosion inhibitor was studied using multiple characterization techniques including ellipsometry, white light interferometry (WLI), grazing incidence reflection absorption Fourier transform infrared (GIRA-FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), electrochemical impedance spectroscopy (EIS) and high-performance liquid chromatography (HPLC). Compared to traditional azole molecules, the novel yellow metal corrosion inhibitor develops a stimuli-responsive film, which would reduce the impact of high levels of halogen on the corrosion of copper and copper alloy surfaces. A tentative structural model describing the improved halogen resistance of copper and copper alloy in the novel yellow metal corrosion inhibitor solution is proposed.

Subject
Films, Water, Substrates, Metal surfaces, X-ray spectroscopy, Silicon, Film formation, Metals, Film thickness, Corrosion inhibitors, Immersion, Copper, Brass
Keywords:
yellow metals, corrosion, inhibitors, halogen resistant, film thickness, inhibition mechanism
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2019
Association for Materials Protection and Performance (AMPP)
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