The effect of Cr, Ni, Ta, and Ti ion implantation at a dose rate of 2 x 1017 ions cm-2 on the electrochemical corrosion behavior of a high density sintered tungsten alloy has been investigated in Cl free and Cl containing aqueous solution buffered to pH 4, 9, and 12. A three sweep potentiodynamic polarization technique was employed to compare the polarization behavior of unimplanted and implanted surfaces. The surfaces of the ion implanted tungsten alloy was characterized by Auger Electron Spectroscopic Analysis.

Subject
Ions, Metal surfaces, Nickel based alloys, Tungsten, Chloride solutions, Density, Anodic current, Surface profile, Titanium alloys, Alloys, Chlorides, Corrosion potential, Potentiodynamic polarization
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1985
Association for Materials Protection and Performance (AMPP)
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