Passive films on α2 and γ titanium aluminide formed potentiostatically in sodium hydroxide (NaOH) and sulfuric acid (H2SO4) solutions were studied by x-ray photoelectron spectroscopy (XPS). In NaOH, potentiostatic experiments showed that titanium aluminides had very similar passive current densities to that of Ti. XPS sputter depth profile showed nearly no Al present in the outer layer of the passive films. In H2SO4, passive current densities increased for specimens with increasing Al content. XPS sputter depth profile showed that Al was enriched in outer layers of the passive films. These results indicated that the passive film dissolution rate increased with increasing amounts of Al in the passive film for titanium aluminides.

Subject
Materials, Binding energy, Passive current, Passive films, Oxide layers, Oxide films, Dissolution, X-ray spectroscopy, Density, Aluminides, Film formation, Sputter deposition, Titanium
Keywords:
aluminum, films, intermetallics, potentiodynamic, potentiostatic, sodium hydroxide, sulfuric acid, titanium, titanium aluminide, x-ray photoelectron spectroscopy
NACE International
1999
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